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Photoresist and Photoresist Ancillaries Market Anticipated to be Valued at US$ 4.2 billion by 2025, at a CAGR of 4.8%, Concludes MarketsandMarkets™ 

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Photoresist and Photoresist Ancillaries Market Anticipated to be Valued at US$ 4.2 billion by 2025, at a CAGR of 4.8%, Concludes MarketsandMarkets™ 

September 20
20:25 2022
Photoresist and Photoresist Ancillaries Market Anticipated to be Valued at US$ 4.2 billion by 2025, at a CAGR of 4.8%, Concludes MarketsandMarkets™ 
Browse 164 market data Tables and 31 Figures spread through 183 Pages and in-depth TOC on “Photoresist & Photoresist Ancillaries Market
Photoresist and Photoresist Ancillaries Market by Application (Semiconductor & IC,LCD, PCB), Photoresist Type (ArF Immersion, ArF Dry Film, KrF, G-line & I-line), Ancillary Type (Anti-reflective Coating, Remover, Developer), Region

The global photoresist and photoresist ancillaries market size is estimated to be USD 3.3 billion in 2020 and projected to reach USD 4.2 billion by 2025, at a CAGR of 4.8%. A photoresist is a light-sensitive material applied to a substrate during photolithography or photoengraving to enable the desired pattern to be imaged, i.e., a properly exposed and developed photoresist masks portions of the substrate with extremely high precision. The growing semiconductor demand and upcoming nanoelectromechanical systems (NEMS) are expected to drive the photoresist and photoresist ancillaries market.  

In a positive resist, the portion of the photoresist that is exposed to light becomes soluble in the photoresist developer. The unexposed portion of the photoresist remains insoluble in the photoresist developer. A negative photoresist is a type of photoresist in which the portion that is exposed to light becomes insoluble in the photoresist developer. The photoresist developer dissolves the unexposed portion of the photoresist.

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Photoresists are classified broadly based on their response to a specific wavelength of light. These materials are sensitive to wavelengths 193 nm (ArF), 248 nm (KrF), 365 nm (I-line), and 436 nm (G-line). Among the mentioned photoresists, ArF is the most widely used as it provides superior resolution with low defect levels, owing to its narrow wavelength and ability to break through a 10 nm level. Antireflective coating, developer, and remover are some of the types of photoresist ancillaries that are majorly used during photolithography.

The photoresist and photoresist ancillaries market is classified based on the application as semiconductor &ICs, LCD, printed circuit boards, and others (NEMS, MEMS, sensors). Among them, semiconductor & ICs is the largest application due to the production of huge volumes of integrated circuits or chips due to the growing demand.

The photoresist and photoresist ancillaries market is studied for five regions, namely APAC, North America, Europe, South America, and Middle East & Africa. APAC is expected to be the fastest-growing regional market due to the growing chip production in Taiwan, China, Japan, and South Korea.

The leading players in the global photoresist and photoresist ancillaries market includes Tokyo Ohka Kogyo Co., Ltd (Japan), JSR Corporation (Japan), DuPont (US), Shin-Etsu Chemical Co., Ltd (Japan), Fujifilm Corporation (Japan), Sumitomo Chemical Co., Ltd. (Japan), ALLRESIST (Germany), Merck Group (Germany), Micro Resist Technology (Germany), and DJ MicroLaminates (US).

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JSR Corporation (Japan) is one of the most extensive rubber & chemical solutions offering companies worldwide. The company operates through four business segments: elastomers business, plastic business, digital solution business, and lifesciences business. It offers photoresist materials under the digital solution business. The company has its presence in 41 overseas locations, including the US, Europe, China, South Korea, Taiwan, and Thailand.

TOKYO OHKA KOGYO CO., LTD is a material manufacturing company focusing mainly on photoresists and high purity chemicals for the photolithography process of semiconductor and display, processing equipment for semiconductor and display manufacturing, and inorganic and organic chemicals. The company headquarters is in Japan and operates through two business segments: material business and equipment business. The company offers photoresist products through the material business segment. Moreover, it has a strong presence in APAC, North America, and Europe.

  • In July 2020, Tokyo Ohka Kogyo (TOK) advanced materials announced that it had started producing extreme ultraviolet (EUV) in its facility at Songdo, Incheon. The step has been taken to serve Samsung electronics as it has increased the use of EUV based lithography for chip production
  • In February 2020, JSR Corporation invested in Inpria Corporation by joining its Series C funding round designed to promote its initiatives for commercializing EUV (Extreme Ultraviolet) photoresist.
  • In February 2020, DuPont introduced three new types of photoresists, namely Riston DI3000, Riston DI5100, and Riston DI 9200.

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